Real-time adjustable mechanism of shielding plate

专利名称：Real-time adjustable mechanism of shielding

plate in sputtering vacuum chamber design

发明人：Geeng Jen Sheu,Chung Chung Liu,Jer Rong

Chang,Yu Chuan Liu,Tuan Jen Yu,Tai YuanHuang

申请号：US11147338申请日：20050608

公开号：US20060278523A1公开日：20061214

专利附图：

摘要：A sputtering system includes a chamber with two frames therein. Several shafts

are pivoted on the frames for rotation and transport. A shielding plate is placed abovethe shafts, and several adjustable mechanisms are between the frames and the shieldingplate. Each of the adjustable mechanisms has an operation member on an exterior side ofthe chamber and an inner member in the chamber, which is connected to the operationmember and the shielding plate. The inner member has a first section with a threadedhole and a second section with a threaded post screwed into the threaded hole of thefirst section. As a result, when the operation member is turned, the relative length andposition of the inner member is changed to elevate or lower the shielding plate, andhence the gap between the carrier and the shielding plate can be adjusted to the desiredallowable value.

申请人：Geeng Jen Sheu,Chung Chung Liu,Jer Rong Chang,Yu Chuan Liu,Tuan Jen Yu,TaiYuan Huang

地址：Taichung City TW,Taichung County TW,Tainan County TW,Tainan CountyTW,Taichung County TW,Yunlin County TW

国籍：TW,TW,TW,TW,TW,TW

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