Silicon particles, silicon particle superlattice a

专利名称：Silicon particles, silicon particle superlattice

and method for producing the same

发明人：Seiichi Sato,Keisaku Kimura,Takashi

Kawasaki,Takuya Okada

申请号：US10592864申请日：20050218公开号：US07850938B2公开日：20101214

专利附图：

摘要：A production method, comprising a step of synthesizing silicon particle-containing silicon oxide particles by performing a gas phase reaction of monosilane gas

and oxidizing gas for oxidizing the monosilane gas and a step of removing the siliconoxide with hydrofluoric acid after holding the silicon oxide particle powder in an inertatmosphere at 800-1400°, provides high-purity silicon nanoparticles which are highlypractical as material powder for high-performance light-emitting elements and electronicparts in an industrial scale.

申请人：Seiichi Sato,Keisaku Kimura,Takashi Kawasaki,Takuya Okada

地址：Hyogo JP,Hyogo JP,Machida JP,Machida JP

国籍：JP,JP,JP,JP

代理机构：Birch, Stewart, Kolasch & Birch, LLP

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