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专利名称：Antireflective Coating Compositons发明人：David Abdallah,Francis Houlihan,Mark
Neisser
申请号：US12797949申请日：20100610
公开号：US20100248137A1公开日：20100930
摘要：The present invention discloses novel bottom anti-reflective coatingcompositions where a coating from the composition has an etch rate that can beregulated by the etch plate temperature.
申请人：David Abdallah,Francis Houlihan,Mark Neisser
地址：Bernardsville NJ US,Millington NJ US,Whitehouse Station NJ US
国籍：US,US,US
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