Method and arrangement for producing radiation

专利名称：Method and arrangement for producing

radiation

发明人：Magnus Berglund,Björn Hansson,Oscar

Hemberg,Hans Hertz,Lars Rymell

申请号：US10513403申请日：20030513公开号：US07239686B2公开日：20070703

专利附图：

摘要：A method of producing a radiating plasma with an increased flux stability anduniformity is disclosed. The method comprises the steps of generating a primary target

by urging a liquid under pressure through a nozzle; directing an energy pre-pulse ontothe primary target to generate a secondary target in the form of a gas or plasma cloud;allowing the thus formed secondary target to expand for a predetermined period oftime; and directing a main energy pulse onto the secondary target when the

predetermined period of time has elapsed in order to produce a plasma radiating X-rayor EUV radiation. The pre-pulse has a beam waist size that is larger, in at least onedimension, than the corresponding dimension of the primary target.

申请人：Magnus Berglund,Björn Hansson,Oscar Hemberg,Hans Hertz,Lars Rymell

地址：Axeltorp SE,Stockholm SE,Stockholm SE,Stocksund SE,Stockholm SE

国籍：SE,SE,SE,SE,SE

代理机构：Buchanan Ingersoll & Rooney PC

更多信息请下载全文后查看