POLYAMIC ACID, VARNISH COMPRISING SAME AND POLYIMI

专利名称：POLYAMIC ACID, VARNISH COMPRISING

SAME AND POLYIMIDE FILM

发明人：Tatsuhiro URAKAMI,Masaki OKAZAKI,Kenichi

FUKUKAWA,Yoshihiro SAKATA,AtsushiOKUBO

申请号：US14781927申请日：20140401

公开号：US20160032055A1公开日：20160204

专利附图：

摘要：The present invention addresses the problem of providing: a polyimide film thathas a small phase difference in the thickness direction and has a low coefficient of linearthermal expansion; and a polyamic acid and varnish to obtain the same. In order to solvethis problem, the present invention provides a polyimide film which comprises polyimidethat is produced by reacting a diamine component and a tetracarboxylic dianhydridecomponent, the polyimide film having a coefficient of linear thermal expansion of 35ppm/K or less over a temperature range of 100 to 200 DEG C, an absolute value of phasedifference in the thickness direction of 200 nm or less per 10 μm thickness, a glasstransition temperature of 260 DEG C or more, and a total light transmittance of 85% ormore.

申请人：MITSUI CHEMICALS, INC.

地址：Tokyo JP

国籍：JP

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